NanoMaker-Editor Build: Jun 2. 2006

Hardware system for SEM/FIB based lithography

NanoMaker-Editor is a software program created purposely to design and manufacture micro and nano electronic devices and objects. It is a hardware system for SEM/FIB based lithography.

This tool has a friendly graphic editor useful for creating structures of any size and shape. It also creates simulation of resist development.

This tool can do corrections for 2D/3D structures and can calculate dose exposure and dose value times for you. NanoMaker-Editor not only converts a scanning electron microscope (SEM) into an e-beam lithograph, but also predicts the results of the lithograph by simulation.

This tool is easily installed on SEM's such as JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCA and others. It is more focused on Ion Beam machines and STM/AFMs.

This hardware system’s software has many helpful functions. It has important applications such as Microelectronics, Nanotechnology, 3D nano-micro patterning, Diffractive optics (synthetic holograms) for visible or X-ray range and Digital microscopy.

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NanoMaker-Editor Build: Jun 2. 2006

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